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Patents Michael P. Meltzer, Christopher P. Steffani, Ray A. Gonfiotti
Processing a Printed Wiring Board by Single Bath Electrodeposition
U.S. Patent 6,547,946 B2
April 15, 2003
A method of processing a printed wiring board by single bath electrodeposition. Initial processing steps are implemented on the printed wiring board. Then copper is plated on the board from a bath containing nickel and copper, followed by nickel plating on the
board. The final processing steps are implemented on the printed wiring board.

Stefan P. Swierkowski
Injector-Concentrator Electrodes for Microchannel Electrophoresis
U.S. Patent 6,558,523 B1
May 6, 2003
An input port geometry, with injector–concentrator electrodes, for a planar microchannel array for electrophoresis. The input port geometry enables efficient extraction and injection of a DNA sample from a single input port. It allows simultaneous concentration, in different channels, of the sample into a longitudinally narrow strip just before releasing it for a run with enhanced injection spatial resolution and time resolution. Optional multiple electrodes, at a different bias than that of the concentrator electrodes, may be used to discriminate against sample impurity ions. Electrode passivation can be used to prevent electrolysis. An additional electrode in or on the input hole can better define the initial loading. The injector–concentrator electrodes are positioned so that they cross the drift channel in a narrow strip at the bond plane between the top and bottom plates of the instrument and are located close to the inlet hole. The optional sample purification electrodes are located at a greater distance from the input hole than the injector–concentrator electrodes.

James A. Folta, Mark Zdeblick
Conformal Chemically Resistant Coatings for Microflow Devices
U.S. Patent 6,562,404 B1
May 13, 2003
A process for coating the inside surfaces of silicon microflow devices, such as electrophoresis microchannels, with a low-stress, conformal silicon nitride film that has the ability to uniformly coat deeply recessed cavities with, for example, aspect ratios of up to 40:1 or higher. The silicon nitride coating allows extended exposure to caustic solutions. The coating enables a microflow device fabricated in silicon to be resistant to all classes of chemicals: acids, bases, and solvents. The process involves low-pressure (vacuum) chemical vapor deposition. The ultralow-stress silicon nitride deposition process allows 1- to 2-micrometer-thick films without cracks and so enables extended chemical protection of a silicon microflow device against caustics for up to a year. Tests have demonstrated the resistance of the films to caustic solutions at both ambient and elevated temperatures to 65°C.

Kirk Patrick Seward
Bistable Microvalve and Microcatheter System
U.S. Patent 6,565,526 B2
May 20, 2003
A bistable microvalve of shape memory material is operatively connected to a microcatheter. The bistable microvalve includes a tip that can be closed off until it is in a desired position. Once it is in position, the bistable microvalve can be opened and closed with the use of heat and pressure. The shape memory material will change stiffness and shape when heated above a transition temperature. The shape memory material is adapted to move from a first shape to a second shape, either open or closed, where it can perform a desired function.

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