Archived News Releases are no longer maintained. Click here for recent News Releases.

Social Media Logos Follow LLNL on YouTube Subscribe to LLNL's RSS feed Follow LLNL on Facebook Follow LLNL on Twitter Follow LLNL on Flickr
Contact: Anne Stark
Phone: (925) 422-9799
E-mail: stark8@llnl.gov
  FOR IMMEDIATE RELEASE
February 7, 2003
NR-03-02-03

Multi-Laboratory Team Wins Excellence Award for Transferring Extreme Ultraviolet Lithography to Private Sector


LIVERMORE, Calif. — The Federal Laboratory Consortium for Technology Transfer has granted the Extreme Ultraviolet Lithography (EUVL) project an Excellency in Technology Transfer award for technology that will lead to microprocessors that are tens of times faster than today’s most powerful chips. The technology also will create memory chips with similar increases in storage capacity.

The EUVL team is made up of scientists and researchers from the Lawrence Livermore National Laboratory, Lawrence Berkeley National Laboratory and Sandia National Laboratories collaborating as the Virtual National Laboratory. The team has successfully transferred the EUVL technology under a multi-year CRADA (Cooperative Research and Development Agreement) to the Extreme Ultraviolet Limited Liability Company (EUV LLC), a consortium headed by Intel Corporation that includes chipmakers Advanced Micro Devices, IBM, Infineon, Micron Technologies and Motorola.

Current lithography technology — which uses light, focused by lenses, to imprint features etched on a silicon chip — has advanced during the past 25 years to essentially double the number of features that can be packed onto each chip every two years. However, by 2007, the steady reduction in feature sizes possible with visible and ultraviolet--light lithography are expected to reach a physical limit, halting advances in the speed and power of microprocessors.

EUVL has been targeted by industry as the next-generation lithography approach to be introduced in 2007 for high-volume manufacturing. It uses EUV light with a wavelength 10 times shorter than the current wavelengths. Since the shorter wavelength is absorbed by lenses, the EUVL system must use a reflective optical system (coated mirrors) instead of transmitting lenses for the operating wavelength of 134 Angstroms. Industry watchers say EUV lithography could be used for the next decade, contrasting current lithographic techniques that are typically oudated within a few years.

The first full-scale prototype EUVL machine, located at Sandia National Laboratories in Livermore, Calif., was completed in 2001. The technology demonstrated by the prototype machine will make possible microprocessors that are 10 times faster with 10 times as many active transistors and memory chips that can store 40 times more information.

“This recognition marks another milestone in the evolution of EUVL technology,” said Don Sweeney, Livermore’s EUVL program manager and director of the EUV Virtual National Laboratory. “It truly is an honor to be recognized for the successful transfer of fundamental science developed at the national laboratory level to the private sector.”

The Lawrence Livermore National Laboratory’s EUVL team is headed by Sweeney of the Physics and Advanced Technologies Directorate. Current team members include Jennifer Alameda, Sasa Bajt, Anton Barty, Sherry Baker, Butch Bradsher, Henry Chapman, Carl Chung, Al Edge, Jim Folta, Layton Hale, Stefan Hau-Riege, Michael Johnson, Patrick Kearney, Cindy Larson, Rick Levesque, Paul Mirkarimi, Nhan Nguyen, Gary Otani, Don Phillion, Jeff Robinson, Mark Schmidt, Frank Snell, Gary Sommargren, Regina Soufli, Victor Sperry, Eberhard Spiller, John S. Taylor and Chris Walton.

The FLC award is only given to organizations that have successfully transferred a technology to a commercial company. A panel of technology transfer experts from industry, state and local government, academia and the federal laboratory system evaluated the nominations.

The Federal Laboratory Consortium for Technology Transfer is a nationwide network of more than 700 federal laboratories that provides a forum to develop strategies and opportunities for linking laboratory technologies with the commercial marketplace. The FLC was organized in 1974 and formally chartered by the Federal Technology Transfer Act of 1986 to promote and strengthen technology transfer nationwide.

On April 11, 2001, Sandia National Laboratories hosted researchers from the national laboratories and members of industry and government at the EUVL Milestone Celebration, which marked the completion of the first full-scale prototype lithography machine for making computer chips using extreme ultraviolet light.


Founded in 1952, Lawrence Livermore National Laboratory is a national security laboratory, with a mission to ensure national security and apply science and technology to the important issues of our time. Lawrence Livermore National Laboratory is managed by the University of California for the U.S. Department of Energy’s National Nuclear Security Administration.

Laboratory news releases and photos are also available electronically on the World Wide Web of the Internet at URL http://www.llnl.gov/PAO and on UC Newswire.


Founded in 1952, Lawrence Livermore National Laboratory is a national security laboratory that develops science and engineering technology and provides innovative solutions to our nation's most important challenges. Lawrence Livermore National Laboratory is managed by Lawrence Livermore National Security, LLC for the U.S. Department of Energy's National Nuclear Security Administration.